• Patent Title: Chamber for degassing substrates
  • Application No.: US15111537
    Application Date: 2015-12-10
  • Publication No.: US09934992B2
    Publication Date: 2018-04-03
  • Inventor: Jurgen Weichart
  • Applicant: Evatec AG
  • Applicant Address: CH Trübbach
  • Assignee: EVATEC AG
  • Current Assignee: EVATEC AG
  • Current Assignee Address: CH Trübbach
  • Agency: Pearne & Gordon LLP
  • International Application: PCT/EP2015/079229 WO 20151210
  • International Announcement: WO2016/092007 WO 20160616
  • Main IPC: H01L21/67
  • IPC: H01L21/67 H01L21/324
Chamber for degassing substrates
Abstract:
A heater or cooler chamber for a batch of more than one workpiece includes a heat storage block. In the block a multitude of pockets are provided, whereby each of the pockets may be closed or opened by a controllably operated door. A heater or cooler arrangement is applied. The pockets are tailored to surround a workpiece applied therein in a non-contact closely spaced manner.
Public/Granted literature
Information query
Patent Agency Ranking
0/0