Invention Grant
- Patent Title: Semiconductor device
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Application No.: US14956398Application Date: 2015-12-02
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Publication No.: US09935099B2Publication Date: 2018-04-03
- Inventor: Zhibiao Zhou , Chen-Bin Lin , Su Xing , Chi-Chang Shuai , Chung-Yuan Lee
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Hsin-Chu
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Hsin-Chu
- Agent Winston Hsu
- Priority: TW104135712A 20151030
- Main IPC: H01L27/06
- IPC: H01L27/06 ; H01L23/535 ; H01L29/22 ; H01L29/861 ; H01L29/10 ; H01L29/24 ; H01L49/02 ; H01L29/06

Abstract:
The present invention provides a semiconductor device including a semiconductor substrate, a first well, a second well, a gate electrode, an oxide semiconductor structure and a diode. The first well is disposed in the semiconductor substrate and has a first conductive type, and the second well is also disposed in the semiconductor substrate, adjacent to the first well, and has a second conductive type. The gate electrode is disposed on the first well. The oxide semiconductor structure is disposed on the semiconductor substrate and electrically connected to the second well. The diode is disposed between the first well and the second well.
Public/Granted literature
- US20170125402A1 SEMICONDUCTOR DEVICE Public/Granted day:2017-05-04
Information query
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