Invention Grant
- Patent Title: Semiconductor device and manufacturing method thereof
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Application No.: US15287888Application Date: 2016-10-07
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Publication No.: US09935141B2Publication Date: 2018-04-03
- Inventor: Masatoshi Kimura
- Applicant: Renesas Electronics Corporation
- Applicant Address: JP Koutou-ku, Tokyo
- Assignee: Renesas Electronics Corporation
- Current Assignee: Renesas Electronics Corporation
- Current Assignee Address: JP Koutou-ku, Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2015-215205 20151030
- Main IPC: H01L27/146
- IPC: H01L27/146 ; H01L27/148 ; H01L31/062 ; H04N5/335

Abstract:
In a semiconductor device in which a plurality of light receiving elements are provided in each of a plurality of pixels that form a solid-state image sensor, a decrease in the performance of the semiconductor device is prevented, the decrease occurring due to an increase in the number of wires. In the pixel having a first photodiode and a second photodiode, a first transfer transistor coupled to the first photodiode and a second transfer transistor coupled to the second photodiode are respectively controlled by the same gate electrode, thereby allowing the number of wires for controlling the first and the second transfer transistors is reduced.
Public/Granted literature
- US20170125466A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2017-05-04
Information query
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