Invention Grant
- Patent Title: Production method for composite substrate
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Application No.: US15449053Application Date: 2017-03-03
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Publication No.: US09935257B2Publication Date: 2018-04-03
- Inventor: Kazumasa Kitamura , Tomoki Nagae
- Applicant: NGK INSULATORS, LTD.
- Applicant Address: JP Nagoya
- Assignee: NGK Insulators, Ltd.
- Current Assignee: NGK Insulators, Ltd.
- Current Assignee Address: JP Nagoya
- Agency: Burr & Brown, PLLC
- Priority: JP2015-181762 20150915
- Main IPC: B44C1/22
- IPC: B44C1/22 ; H01L41/337 ; B24B37/10 ; H01L21/768 ; H01L21/306 ; B81C1/00

Abstract:
A production method for a composite substrate according to the present invention comprises (a) a step of mirror-polishing a piezoelectric-substrate side of a laminated substrate formed by bonding a piezoelectric substrate and a support substrate; (b) a step of performing machining using an ion beam or a neutral atom beam so that a thickness of an outer peripheral portion of the piezoelectric substrate is larger than a thickness of an inner peripheral portion and a difference between a largest thickness and a smallest thickness of the inner peripheral portion of the piezoelectric substrate is 100 nm or less over an entire surface; and (c) a step of flattening the entire surface of the piezoelectric substrate to remove at least a part of an altered layer formed by the machining using the ion beam or the neutral atom beam in the step (b).
Public/Granted literature
- US20170179371A1 PRODUCTION METHOD FOR COMPOSITE SUBSTRATE Public/Granted day:2017-06-22
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