- Patent Title: Methods for removing acidic impurities from halogenated propenes
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Application No.: US15232089Application Date: 2016-08-09
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Publication No.: US09938213B2Publication Date: 2018-04-10
- Inventor: Haiyou Wang , Hsueh Sung Tung
- Applicant: Honeywell International, Inc.
- Applicant Address: US NJ Morris Plains
- Assignee: Honeywell International Inc.
- Current Assignee: Honeywell International Inc.
- Current Assignee Address: US NJ Morris Plains
- Agent Bruce O. Bradford
- Main IPC: C07C17/389
- IPC: C07C17/389 ; C07C21/18

Abstract:
This invention pertains to a method for removing acidic impurity from halogenated olefins, especially methods for removing acidic impurity from halogenated propenes, and even more particularly to methods for removing acidic impurity from 1,3,3,3-tetrafluoro-1-propene (HFO-1234ze), 2,3,3,3-tetrafluoro-1-propene (HFO-1234yf), 1-chloro-3,3,3-trifluoro-1-propene (HCFO-1233zd), and 2-chloro-3,3,3-trifluoro-1-propene (HCFO-1233xf). The method is conducted by passing the halogenated olefin stream, in liquid or gas form, through a solid adsorbent bed, which contains at least one acid reactive agent.
Public/Granted literature
- US20170050905A1 Methods for Removing Acidic Impurities from Halogenated Propenes Public/Granted day:2017-02-23
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