A calibration pattern having a plurality of pattern regions for calibrating an imaging optical unit for metrological applications. At least one image of the calibration pattern is recorded using the imaging optical unit. The image is evaluated to quantify individual properties of the imaging optical unit. Depending on the quantified individual properties, correction values for a calculated correction of aberrations of the imaging optical unit are determined. The calibration pattern is provided on an electronic display having a plurality of display pixels arranged in the form of a matrix. In addition, a calibration body with at least one line having a defined dimension, is recorded using the imaging optical unit. A magnification factor of the imaging optical unit is determined on the basis of the at least one line. At least one further individual property of the imaging optical unit is quantified on the basis of the calibration pattern.