Invention Grant
- Patent Title: Photosensitive resin composition for color filter and application of the same
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Application No.: US15147913Application Date: 2016-05-06
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Publication No.: US09939568B2Publication Date: 2018-04-10
- Inventor: Jung-Pin Hsu , Bo-Hsuan Lin
- Applicant: Chi Mei Corporation
- Applicant Address: TW Tainan
- Assignee: Chi Mei Corporation
- Current Assignee: Chi Mei Corporation
- Current Assignee Address: TW Tainan
- Agency: JCIPRNET
- Priority: TW104114414A 20150506
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G02B5/22 ; G03F7/00 ; G02F1/1335 ; G03F7/031 ; G03F7/032 ; G03F7/033 ; G03F7/038

Abstract:
The present invention relates to a photosensitive resin composition for a color filter and an application of the same. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), an organic solvent (D) and a pigment (E). The alkali-soluble resin (A) includes a first alkali-soluble resin (A-1) having the structure represented by formula (1). The aforementioned photosensitive resin composition is advantageously applied for the color filer with better contrast.
Public/Granted literature
- US20160327863A1 PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND APPLICATION OF THE SAME Public/Granted day:2016-11-10
Information query
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