Invention Grant
- Patent Title: Method of measuring a property of a target structure, inspection apparatus, lithographic system and device manufacturing method
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Application No.: US15473879Application Date: 2017-03-30
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Publication No.: US09940703B2Publication Date: 2018-04-10
- Inventor: Murat Bozkurt , Martin Jacobus Johan Jak , Patricius Aloysius Jacobus Tinnemans
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP14183095 20140901
- Main IPC: G06K9/62
- IPC: G06K9/62 ; G06T7/00 ; G03F7/20 ; G06T7/11

Abstract:
A property of a target structure is measured based on intensity of an image of the target. The method includes (a) obtaining an image of the target structure; (b) defining a plurality of candidate regions of interest, each candidate region of interest comprising a plurality of pixels in the image; (c) defining an optimization metric value for the candidate regions of interest based at least partly on signal values of pixels within the region of interest; (d) defining a target signal function which defines a contribution of each pixel in the image to a target signal value. The contribution of each pixel depends on (i) which candidate regions of interest contain that pixel and (ii) optimization metric values of those candidate regions of interest.
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