Invention Grant
- Patent Title: Pattern accuracy detecting apparatus and processing system
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Application No.: US15253476Application Date: 2016-08-31
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Publication No.: US09941177B2Publication Date: 2018-04-10
- Inventor: Kentaro Kasa , Kazuya Fukuhara , Kazutaka Ishigo , Manabu Takakuwa , Yoshinori Hagio , Kazuhiro Segawa , Yuki Murasaka , Tetsuya Kugimiya , Yuu Yamayose , Yosuke Okamoto
- Applicant: TOSHIBA MEMORY CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Toshiba Memory Corporation
- Current Assignee: Toshiba Memory Corporation
- Current Assignee Address: JP Tokyo
- Agency: Patterson & Sheridan, LLP
- Priority: JP2016-052906 20160316
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/66 ; G01B11/27 ; G01B11/30 ; G01N25/72 ; H01L21/67 ; H01L21/027 ; G03F7/20 ; G03F7/039 ; G03F7/26
Abstract:
A pattern accuracy detecting apparatus includes a stage for supporting a substrate, an optical warpage detecting unit that measures a shape of a substrate disposed on the stage, an optical pattern detection unit that detects a position of a pattern on the substrate, and a processing unit that corrects the detected pattern position based on the measured shape of the substrate.
Public/Granted literature
- US20170271214A1 PATTERN ACCURACY DETECTING APPARATUS AND PROCESSING SYSTEM Public/Granted day:2017-09-21
Information query
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