Invention Grant
- Patent Title: Method for manufacturing semiconductor structure
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Application No.: US15228746Application Date: 2016-08-04
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Publication No.: US09941186B2Publication Date: 2018-04-10
- Inventor: Chin-Liang Chen , Chi-Yang Yu , Kuan-Lin Ho , Yu-Min Liang
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee Address: TW Hsinchu
- Agency: WPAT, P.C., Intellectual Property Attorneys
- Agent Anthony King
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L23/373 ; H01L21/56 ; H01L21/683 ; H01L21/78 ; H01L23/00

Abstract:
A method for manufacturing a semiconductor structure is disclosed. The method includes: providing a semiconductor substrate having a plurality of dies thereon; dispensing an underfill material and a molding compound to fill spaces beneath and between the dies; disposing a temporary carrier over the dies; thinning a thickness of the semiconductor substrate; performing back side metallization upon the thinned semiconductor substrate; removing the temporary carrier; and attaching a plate over the dies. An associated semiconductor structure is also disclosed.
Public/Granted literature
- US20180005919A1 SEMICONDUCTOR STRUCTURE AND ASSOCIATED METHOD FOR MANUFACTURING THE SAME Public/Granted day:2018-01-04
Information query
IPC分类: