Invention Grant
- Patent Title: 3D non-volatile memory array utilizing metal ion source
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Application No.: US15264919Application Date: 2016-09-14
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Publication No.: US09947685B2Publication Date: 2018-04-17
- Inventor: Shosuke Fujii , Kazuhiko Yamamoto
- Applicant: Toshiba Memory Corporation
- Applicant Address: JP Minato-ku
- Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2016-053064 20160316
- Main IPC: H01L27/115
- IPC: H01L27/115 ; H01L27/11582 ; H01L27/11556 ; H01L23/528 ; G11C16/04 ; G11C16/06 ; H01L27/1157 ; H01L27/11524 ; H01L45/00

Abstract:
According to one embodiment, a semiconductor memory device includes a semiconductor layer, a plurality of conductive layers, a plurality of insulating layers, an intermediate layer, and a controller. The conductive layers and the insulating layers are alternately provided. The intermediate layer is provided between the plurality of conductive layers and the semiconductor layer. The controller is configured to perform first and second operations. In first operation, the controller applies a first voltage to the semiconductor layer, applies a second voltage higher than the first voltage to a first conductive layer, and applies a third voltage to other conductive layers. In the second operation, the controller applies a fourth voltage to the semiconductor layer, applies a fifth voltage to the first conductive layer, and applies a sixth voltage to the other conductive layers.
Public/Granted literature
- US20170271360A1 3D NON-VOLATILE MEMORY ARRAY UTILIZING METAL ION SOURCE Public/Granted day:2017-09-21
Information query
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