A material includes a substrate with a thin-film multilayer coated on at least one surface of the substrate, the thin-film multilayer including at least two films based on a transparent electrically conductive oxide. The at least two films are separated by at least one dielectric intermediate film having a physical thickness of at most 50 nm. No metal films is deposited between the at least two films based on a transparent electrically conductive oxide. The thin-film multilayer further includes at least one oxygen barrier film located above the film located furthest from the substrate of the at least two films based on a transparent electrically conductive oxide. Each film of the at least two films based on a transparent electrically conductive oxide has a physical thickness in a range of from 20 to 80 nm.