Invention Grant
- Patent Title: Polyvinylacetal resin for heat-developable photosensitive material and heat-developable photosensitive material
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Application No.: US15124103Application Date: 2014-03-24
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Publication No.: US09951154B2Publication Date: 2018-04-24
- Inventor: Kenji Yamauchi , Jiro Miyai , Shogo Naruwaki , Takayuki Maeda
- Applicant: SEKISUI CHEMICAL CO., LTD.
- Applicant Address: JP Osaka
- Assignee: SEKISUI CHEMICAL CO., LTD.
- Current Assignee: SEKISUI CHEMICAL CO., LTD.
- Current Assignee Address: JP Osaka
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- International Application: PCT/JP2014/059383 WO 20140324
- International Announcement: WO2015/145781 WO 20151001
- Main IPC: G03C1/498
- IPC: G03C1/498 ; C08F8/28 ; C09D129/14 ; C09D5/26 ; C09D5/32

Abstract:
A polyvinyl acetal resin for a heat-developable photosensitive material capable of preventing skinning in the coating process of the photosensitive layer of the heat-developable photosensitive material, preventing deterioration of image characteristics and coloration of the coating solution, and suppressing the occurrence of odor at the time of producing the heat-developable photosensitive material and heat development.The polyvinyl acetal resin for a heat-developable photosensitive material used for a photosensitive layer of the heat-developable photosensitive material has a residual acetyl group content of 25 mol % or less, residual hydroxyl group content of 17-35 mol %, and polymerization degree of 200 to 3,000, and is obtained by an acetalization of a polyvinyl alcohol mixture containing polyvinyl alcohol resins having different polymerization degrees, wherein the content of the polyvinyl alcohol having a polymerization degree of 600 or less is 50 wt % or higher in the polyvinyl alcohol mixture.
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