Invention Grant
- Patent Title: Apparatus and method for making atomic layer deposition on fine powders
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Application No.: US13602315Application Date: 2012-09-03
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Publication No.: US09951419B2Publication Date: 2018-04-24
- Inventor: Ying-Bing Jiang , Hongxia Zhang
- Applicant: Ying-Bing Jiang , Hongxia Zhang
- Main IPC: C23C16/44
- IPC: C23C16/44 ; C23C16/455 ; C04B35/622

Abstract:
Method and apparatus for making atomic layer deposition on powdered materials are provided. A rotary vessel with tilted rotation axis can be used as the deposition chamber. The rotary vessel can be directly used as the deposition chamber, or the rotary vessel is positioned inside a vacuum chamber that serves as the deposition chamber. A hallow shaft can be used to deliver rotary motion and facilitate pumping. A tube can be inserted into the hollow shaft or the rotary vessel to introduce precursors. Gas diffuser and slowly increased pumping speed can be used to reduce the agitation caused by gas flow. Intermittent rotation, variable rotary speed, extruding structures on inner surface of the rotary vessel, and the addition of easy-to-agitate powder or beads of other materials can be used to enhance the powder agitation caused by rotation.
Public/Granted literature
- US20130059073A1 Apparatus and Method for making atomic layer deposition on fine powders Public/Granted day:2013-03-07
Information query
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