Invention Grant
- Patent Title: Method for growing silicon carbide crystal
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Application No.: US14559362Application Date: 2014-12-03
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Publication No.: US09951439B2Publication Date: 2018-04-24
- Inventor: Naofumi Shinya , Yu Hamaguchi , Norio Yamagata , Takehisa Minowa
- Applicant: Shin-Etsu Chemical Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2013-253411 20131206; JP2013-253426 20131206; JP2013-253490 20131206; JP2013-253502 20131206; JP2013-253540 20131206; JP2013-253541 20131206
- Main IPC: C30B13/02
- IPC: C30B13/02 ; C30B17/00 ; C30B29/36 ; C30B13/14 ; C30B15/02 ; C30B15/20 ; C30B11/08 ; C30B15/10 ; C30B19/04 ; C30B9/10

Abstract:
In the present invention, a crucible formed of SiC as a main component is used as a container for a Si—C solution. A metal element M (M is at least one metal element selected from at least one of a first group consisting of La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho and Lu, a second group consisting of Ti, V, Cr, Mn, Fe, Co, Ni and Cu and a third group consisting of Al, Ga, Ge, Sn, Pb and Zn) is added to the Si—C solution and the crucible is heated to elute Si and C, which are derived from a main component SiC of the crucible, from a high-temperature surface region of the crucible in contact with the Si—C solution, into the Si—C solution. In this way, precipitation of a SiC polycrystal on a surface of the crucible in contact with the Si—C solution is suppressed.
Public/Granted literature
- US20150159297A1 METHOD FOR GROWING SILICON CARBIDE CRYSTAL Public/Granted day:2015-06-11
Information query
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