Invention Grant
- Patent Title: Demountable interconnect structure
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Application No.: US12061141Application Date: 2008-04-02
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Publication No.: US09953910B2Publication Date: 2018-04-24
- Inventor: Charles Gerard Woychik , Raymond Albert Fillion
- Applicant: Charles Gerard Woychik , Raymond Albert Fillion
- Applicant Address: US NY Schenectady
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Schenectady
- Agency: Ziolkowski Patent Solutions Group, SC
- Main IPC: H01L23/498
- IPC: H01L23/498 ; H01L23/00 ; H01L23/538

Abstract:
An electronic component includes a base insulative layer having first and second surfaces; an electronic device having first and second surfaces; at least one I/O contact located on the first surface of the electronic device; an adhesive layer disposed between the first surface of the electronic device and the second surface of the base insulative layer; a first metal layer disposed on the I/O contact; and a removable layer disposed between the first surface of the electronic device and the second surface of the base insulative layer, and located adjacent to the first metal layer. The base insulative layer secures to the electronic device through the first metal layer and removable layer. The first metal layer and removable layer can release the base insulative layer from the electronic device when the first metal layer and removable layer are exposed to a temperature higher than their softening points or melting points.
Public/Granted literature
- US20080318027A1 DEMOUNTABLE INTERCONNECT STRUCTURE Public/Granted day:2008-12-25
Information query
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