Invention Grant
- Patent Title: Substrate processing method
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Application No.: US14978693Application Date: 2015-12-22
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Publication No.: US09956594B2Publication Date: 2018-05-01
- Inventor: Atsuyasu Miura , Naoki Sawazaki
- Applicant: SCREEN Holdings Co., Ltd.
- Applicant Address: JP
- Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee Address: JP
- Agency: Ostrolenk Faber LLP
- Priority: JP2014-265537 20141226
- Main IPC: B08B3/02
- IPC: B08B3/02 ; B08B3/10 ; B08B3/08 ; H01L21/02 ; H01L21/67

Abstract:
A substrate processing method includes a substrate holding step of holding a substrate horizontally, a liquid droplet discharging step wherein liquid droplets of an organic solvent, formed by mixing the organic solvent and a gas, are discharged from a double-fluid nozzle toward a predetermined discharge region within an upper surface of the substrate, and a liquid film forming step, executed before the liquid droplet discharging step, of supplying the organic solvent to the double fluid nozzle without supplying the gas, so as to discharge the organic solvent in a continuous stream mode from the double-fluid nozzle to form a liquid film of the organic solvent covering the discharge region on the upper surface of the substrate.
Public/Granted literature
- US20160184870A1 SUBSTRATE PROCESSING METHOD Public/Granted day:2016-06-30
Information query
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