Invention Grant
- Patent Title: Target age compensation method for performing stable reactive sputtering processes
-
Application No.: US14902575Application Date: 2014-06-30
-
Publication No.: US09957600B2Publication Date: 2018-05-01
- Inventor: Denis Kurapov , Siegfried Krassnitzer
- Applicant: Oerlikon Surface Solutions AG
- Applicant Address: CH Präffikon
- Assignee: Oerlikon Surface Solutions AG, Präffikon
- Current Assignee: Oerlikon Surface Solutions AG, Präffikon
- Current Assignee Address: CH Präffikon
- Priority: DE102013011068 20130703
- International Application: PCT/EP2014/001780 WO 20140630
- International Announcement: WO2015/000575 WO 20150108
- Main IPC: C23C14/00
- IPC: C23C14/00 ; C23C14/06 ; C23C14/34 ; C23C14/54 ; H01J37/32 ; H01J37/34 ; C23C14/14 ; C23C14/35

Abstract:
A method for performing reactive sputtering processes while maintaining the sputtering characteristic at the target as well as the deposition rate constant, or at least in an acceptable range for the industrial production context, independent of the target age.
Public/Granted literature
- US20160168686A1 TARGET AGE COMPENSATION METHOD FOR PERFORMING STABLE REACTIVE SPUTTERING PROCESSES Public/Granted day:2016-06-16
Information query
IPC分类: