Invention Grant
- Patent Title: Ruthenium compound, preparation method therefor, precursor composition for film deposition containing same, and method for depositing film by using same
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Application No.: US15314839Application Date: 2015-05-26
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Publication No.: US09957614B2Publication Date: 2018-05-01
- Inventor: Won Seok Han , So Young Kim , Wonyong Koh
- Applicant: UP CHEMICAL CO., LTD.
- Applicant Address: KR Pyeongtaek-si
- Assignee: UP Chemical Co., Ltd.
- Current Assignee: UP Chemical Co., Ltd.
- Current Assignee Address: KR Pyeongtaek-si
- Agency: Greer, Burns & Crain, Ltd.
- Priority: KR10-2014-0065854 20140530; KR10-2014-0163832 20141121
- International Application: PCT/KR2015/005232 WO 20150526
- International Announcement: WO2015/182946 WO 20151203
- Main IPC: C07F15/00
- IPC: C07F15/00 ; C23C16/455 ; C09D1/00 ; C23C16/06
Abstract:
The present disclosure relates to a novel ruthenium compound, a method for preparing the ruthenium compound, a precursor composition for depositing a ruthenium-containing film including the ruthenium compound, and a method for depositing a ruthenium-containing film by using the precursor composition.
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