Invention Grant
- Patent Title: Resist composition and patterning process
-
Application No.: US15390855Application Date: 2016-12-27
-
Publication No.: US09958776B2Publication Date: 2018-05-01
- Inventor: Jun Hatakeyama , Masaki Ohashi
- Applicant: SHIN-ETSU CHEMICAL CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2015-256346 20151228; JP2016-135025 20160707
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/039 ; G03F7/038 ; G03F7/16 ; G03F7/38 ; G03F7/20 ; G03F7/32 ; C07F9/06 ; C07C211/62 ; C07C211/63
Abstract:
A resist composition comprising a base polymer and a phosphazene salt compound offers a high dissolution contrast, minimal LWR, and dimensional stability on PPD.
Public/Granted literature
- US20170184964A1 RESIST COMPOSITION AND PATTERNING PROCESS Public/Granted day:2017-06-29
Information query
IPC分类:
