Invention Grant
- Patent Title: Resist composition and patterning process
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Application No.: US15408574Application Date: 2017-01-18
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Publication No.: US09958777B2Publication Date: 2018-05-01
- Inventor: Jun Hatakeyama , Masaki Ohashi
- Applicant: SHIN-ETSU CHEMICAL CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2016-008473 20160120
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C07C63/08 ; C07C69/753 ; H01L21/027 ; C07C69/635 ; G03F7/038 ; G03F7/039 ; G03F7/16 ; G03F7/20 ; G03F7/32 ; G03F7/38
Abstract:
A resist composition comprising a base polymer and a sulfonium salt capable of generating fluorinated aminobenzoic acid offers a satisfactory dissolution contrast and minimal LWR independent of whether it is of positive or negative tone.
Public/Granted literature
- US20170205709A1 RESIST COMPOSITION AND PATTERNING PROCESS Public/Granted day:2017-07-20
Information query
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