Invention Grant
- Patent Title: Apparatus for post exposure bake
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Application No.: US15196725Application Date: 2016-06-29
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Publication No.: US09958782B2Publication Date: 2018-05-01
- Inventor: Kyle M. Hanson , Gregory J. Wilson , Viachslav Babayan
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan, LLP
- Main IPC: H01L21/67
- IPC: H01L21/67 ; C23C16/50 ; C23C16/56 ; G03F7/38 ; C23C16/54 ; H01L21/677

Abstract:
Embodiments described herein relate to methods and apparatus for performing immersion field guided post exposure bake processes. Embodiments of apparatus described herein include a chamber body defining a processing volume. Electrodes may be disposed adjacent the process volume and process fluid is provided to the process volume via a plurality of fluid conduits to facilitate immersion field guided post exposure bake processes. A post process chamber for rinsing, developing, and drying a substrate is also provided.
Public/Granted literature
- US20180004094A1 APPARATUS FOR POST EXPOSURE BAKE Public/Granted day:2018-01-04
Information query
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