Invention Grant
- Patent Title: Method of metrology, inspection apparatus, lithographic system and device manufacturing method
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Application No.: US15186031Application Date: 2016-06-17
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Publication No.: US09958789B2Publication Date: 2018-05-01
- Inventor: Peter Hanzen Wardenier , Frank Staals , Jean-Pierre Agnes Henricus Marie Vaessen , Hans Van Der Laan
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP15172709 20150618
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G01B11/03

Abstract:
Disclosed is a method of determining a correction for measured values of radiation diffracted from a target comprising a plurality of periodic structures, subsequent to measurement of the target using measurement radiation defining a measurement field. The correction acts to correct for measurement field location dependence in the measured values. The method comprises performing a first and second measurements of the periodic structures; and determining a correction from said first measurement and said second measurement. The first measurement is performed with said target being in a normal measurement location with respect to the measurement field. The second measurement is performed with the periodic structure in a shifted location with respect to the measurement field, said shifted location comprising the location of another of said periodic structures when said target is in said normal measurement location with respect to the measurement field.
Public/Granted literature
- US20160370710A1 Method of Metrology, Inspection Apparatus, Lithographic System and Device Manufacturing Method Public/Granted day:2016-12-22
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