Invention Grant
- Patent Title: Lithographic apparatus, positioning system for use in a lithographic apparatus and method
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Application No.: US14897503Application Date: 2014-06-26
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Publication No.: US09958793B2Publication Date: 2018-05-01
- Inventor: Roan Marinus Westerhof , Hubertus Luberta Hagenaars , Ulrich Schönhoff , Adrianus Josephus Petrus Van Engelen
- Applicant: ASML Netherlands B.V. , CARL ZEISS SMT GmbH
- Applicant Address: NL Veldhoven DE Oberkochen
- Assignee: ASML NETHERLANDS B.V.,CARL ZEISS SMT GMBH
- Current Assignee: ASML NETHERLANDS B.V.,CARL ZEISS SMT GMBH
- Current Assignee Address: NL Veldhoven DE Oberkochen
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2014/063483 WO 20140626
- International Announcement: WO2015/000777 WO 20150108
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03F7/20

Abstract:
A lithographic apparatus having a reference body and a positioning system, the positioning system including a main body; a reaction body; an actuator; and a controller. The main body is moveable relative to the reference body along a path in a first direction and a second opposite direction. The reaction body is moveable relative to the main body along a further path in the first and second directions and is moveably connected to the reference body to be moveable relative to the reference body in the first and second directions. The controller provides a first and a second signal to the actuator. The actuator is arranged between the main body and the reaction body to accelerate the main body in the first direction and to accelerate the reaction body in the second direction under control of the first signal, and to accelerate the main body in the second direction and to accelerate the reaction body in the first direction under control of the second signal. The controller determines when the reaction body moves in the second direction and to provide the second signal after the first signal to the actuator when the reaction body moves in the second direction along the further path.
Public/Granted literature
- US20160109814A1 LITHOGRAPHIC APPARATUS, POSITIONING SYSTEM FOR USE IN A LITHOGRAPHIC APPARATUS AND METHOD Public/Granted day:2016-04-21
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