Invention Grant
- Patent Title: Semiconductor device with stripe-shaped trench gate structures and gate connector structure
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Application No.: US15358316Application Date: 2016-11-22
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Publication No.: US09960243B2Publication Date: 2018-05-01
- Inventor: Thomas Aichinger , Wolfgang Bergner
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Slater Matsil, LLP
- Priority: DE102014119466 20141222
- Main IPC: H01L29/51
- IPC: H01L29/51 ; H01L29/423 ; H01L29/739 ; H01L29/16 ; H01L29/06 ; H01L21/8234 ; H01L29/78 ; H01L21/02 ; H01L21/04 ; H01L23/00

Abstract:
A semiconductor device includes a transistor cell with a stripe-shaped trench gate structure that extends from a first surface into a semiconductor body. A gate connector structure at a distance to the first surface is electrically connected to a gate electrode in the trench gate structure. A gate dielectric separates the gate electrode from the semiconductor body. First sections of the gate dielectric outside a vertical projection of the gate connector structure are thinner than second sections within the vertical projection of the gate connector structure.
Public/Granted literature
- US20170077251A1 Semiconductor Device with Stripe-Shaped Trench Gate Structures and Gate Connector Structure Public/Granted day:2017-03-16
Information query
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