Invention Grant
- Patent Title: Method for producing organic semiconductor film and organic transistor
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Application No.: US15447852Application Date: 2017-03-02
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Publication No.: US09960351B2Publication Date: 2018-05-01
- Inventor: Hiroshi Ohta
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Studebaker & Brackett PC
- Priority: JP2014-199122 20140929
- Main IPC: H01L51/00
- IPC: H01L51/00 ; H01L51/05

Abstract:
A method for producing an organic semiconductor film includes performing, in random order, applying an ink including an organic semiconductor, a first solvent having high affinity for the organic semiconductor, and a second solvent having lower affinity for the organic semiconductor than the first solvent and having a higher boiling point than the first solvent, to a lyophilic region of a substrate having at least one of a lyophilic region or a liquid repellent region disposed in the vicinity of the lyophilic region on a surface, and applying a solvent composed of the same type of solvent as the first solvent and used for controlling a volatilization rate of the first solvent in the ink applied to the lyophilic or the liquid repellant region; and then causing the first and second solvent in the ink applied to the lyophilic region to volatilize to produce an organic semiconductor film.
Public/Granted literature
- US20170179388A1 METHOD FOR PRODUCING ORGANIC SEMICONDUCTOR FILM AND ORGANIC TRANSISTOR Public/Granted day:2017-06-22
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