Invention Grant
- Patent Title: Method of forming catalyst layer by single step infiltration
-
Application No.: US15208912Application Date: 2016-07-13
-
Publication No.: US09960428B1Publication Date: 2018-05-01
- Inventor: Kirk Gerdes , Shiwoo Lee , Regis Dowd
- Applicant: Energy, United States Department of
- Applicant Address: US DC Washington
- Assignee: U.S. Department of Energy
- Current Assignee: U.S. Department of Energy
- Current Assignee Address: US DC Washington
- Agent Jacob A. Heafner; Michael J. Dobbs; Brian J. Lally
- Main IPC: H01M4/88
- IPC: H01M4/88 ; H01M8/12 ; H01M4/86 ; H01M8/124
Abstract:
Provided herein is a method for electrocatalyst infiltration of a porous substrate, of particular use for preparation of a cathode for a solid oxide fuel cell. The method generally comprises preparing an electrocatalyst infiltrate solution comprising an electrocatalyst, surfactant, chelating agent, and a solvent; pretreating a porous mixed ionic-electric conductive substrate; and applying the electrocatalyst infiltration solution to the porous mixed ionic-electric conductive substrate.
Information query
