Invention Grant
- Patent Title: Cleaning of CVD production spaces
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Application No.: US14783858Application Date: 2014-03-20
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Publication No.: US09962745B2Publication Date: 2018-05-08
- Inventor: Harald Hertlein , Friedrich Popp
- Applicant: WACKER CHEMIE AG
- Applicant Address: DE Munich
- Assignee: WACKER CHEMIE AG
- Current Assignee: WACKER CHEMIE AG
- Current Assignee Address: DE Munich
- Agency: Brooks Kushman P.C.
- Priority: DE102013206436 20130411
- International Application: PCT/EP2014/055605 WO 20140320
- International Announcement: WO2014/166718 WO 20141016
- Main IPC: B08B3/08
- IPC: B08B3/08 ; B08B3/10 ; B08B3/04 ; C01B33/035 ; B08B1/00 ; C01B33/02
Abstract:
Contamination of surfaces of polysilicon rods removed from a Siemens reactor in a polysilicon production facility is reduced by cleaning the production facility at least every other week with a cleaning liquid containing water, optionally also containing neutral surfactants.
Public/Granted literature
- US20160045940A1 CLEANING OF CVD PRODUCTION SPACES Public/Granted day:2016-02-18
Information query
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