• Patent Title: Block copolymer composition, production method therefor, and film
  • Application No.: US15107179
    Application Date: 2014-12-26
  • Publication No.: US09963584B2
    Publication Date: 2018-05-08
  • Inventor: Ryoji OdaYuta Ishii
  • Applicant: ZEON CORPORATION
  • Applicant Address: JP Chiyoda-ku, Tokyo
  • Assignee: ZEON CORPORATION
  • Current Assignee: ZEON CORPORATION
  • Current Assignee Address: JP Chiyoda-ku, Tokyo
  • Agency: Kenja IP Law PC
  • Priority: JP2013-270890 20131227
  • International Application: PCT/JP2014/084665 WO 20141226
  • International Announcement: WO2015/099163 WO 20150702
  • Main IPC: C08L53/02
  • IPC: C08L53/02 C08J5/18
Block copolymer composition, production method therefor, and film
Abstract:
The present invention provides a block copolymer composition comprising a block copolymer A represented by formula (A) and a block copolymer B represented by formula (B), the block copolymer composition having a water content of 200 ppm by weight or less when the block copolymer composition has been formed in a shape of pellets, dried, and allowed to stand at a temperature of 37° C. and a relative humidity of 70% for 24 hours. In the formulas, Ar1a, Ar1b, and Ar2b are aromatic vinyl polymer blocks having a weight average molecular weight of 6,000-18,000, Ar2a is an aromatic vinyl polymer block having a weight average molecular weight of 40,000-400,000, and Da and Db are specific conjugated diene polymer blocks. The block copolymer composition has a high modulus of elasticity, exhibits low tension set, and ensures that the formation of a hole is prevented when a film is formed by melt-forming the block copolymer composition. Ar1a-Da-Ar2a  (A) Ar1b-Db-Ar2b  (B)
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