- Patent Title: Block copolymer composition, production method therefor, and film
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Application No.: US15107179Application Date: 2014-12-26
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Publication No.: US09963584B2Publication Date: 2018-05-08
- Inventor: Ryoji Oda , Yuta Ishii
- Applicant: ZEON CORPORATION
- Applicant Address: JP Chiyoda-ku, Tokyo
- Assignee: ZEON CORPORATION
- Current Assignee: ZEON CORPORATION
- Current Assignee Address: JP Chiyoda-ku, Tokyo
- Agency: Kenja IP Law PC
- Priority: JP2013-270890 20131227
- International Application: PCT/JP2014/084665 WO 20141226
- International Announcement: WO2015/099163 WO 20150702
- Main IPC: C08L53/02
- IPC: C08L53/02 ; C08J5/18

Abstract:
The present invention provides a block copolymer composition comprising a block copolymer A represented by formula (A) and a block copolymer B represented by formula (B), the block copolymer composition having a water content of 200 ppm by weight or less when the block copolymer composition has been formed in a shape of pellets, dried, and allowed to stand at a temperature of 37° C. and a relative humidity of 70% for 24 hours. In the formulas, Ar1a, Ar1b, and Ar2b are aromatic vinyl polymer blocks having a weight average molecular weight of 6,000-18,000, Ar2a is an aromatic vinyl polymer block having a weight average molecular weight of 40,000-400,000, and Da and Db are specific conjugated diene polymer blocks. The block copolymer composition has a high modulus of elasticity, exhibits low tension set, and ensures that the formation of a hole is prevented when a film is formed by melt-forming the block copolymer composition. Ar1a-Da-Ar2a (A) Ar1b-Db-Ar2b (B)
Public/Granted literature
- US20170369699A9 BLOCK COPOLYMER COMPOSITION, PRODUCTION METHOD THEREFOR, AND FILM Public/Granted day:2017-12-28
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