Invention Grant
- Patent Title: Synthetic quartz glass substrate polishing slurry and manufacture of synthetic quartz glass substrate using the same
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Application No.: US13676213Application Date: 2012-11-14
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Publication No.: US09963634B2Publication Date: 2018-05-08
- Inventor: Harunobu Matsui , Daijitsu Harada , Masaki Takeuchi
- Applicant: SHIN-ETSU CHEMICAL CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2011-252633 20111118
- Main IPC: C09K13/00
- IPC: C09K13/00 ; B24B7/24 ; C09K13/02 ; C03C19/00 ; C09G1/02
Abstract:
In polishing of synthetic quartz glass substrates, a polishing slurry is used comprising (i) an oligopeptide comprising recurring units of pentapeptide: -[valine-proline-glycine-valine-glycine]- and having a molecular weight of 800-150,000 or a copolymer of the pentapeptide with another monomer, and (ii) a colloidal solution.
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