Invention Grant
- Patent Title: Low-stress mount assembly
-
Application No.: US15121226Application Date: 2015-02-26
-
Publication No.: US09964730B2Publication Date: 2018-05-08
- Inventor: Torsten Erbe , Jan Werschnik
- Applicant: JENOPTIK Optical Systems GmbH
- Applicant Address: DE Jena
- Assignee: JENOPTIK Optical Systems GmbH
- Current Assignee: JENOPTIK Optical Systems GmbH
- Current Assignee Address: DE Jena
- Agency: Duane Morris, LLP
- Priority: DE102014102715 20140228
- International Application: PCT/DE2015/100078 WO 20150226
- International Announcement: WO2015/127928 WO 20150903
- Main IPC: G02B7/02
- IPC: G02B7/02 ; G02B7/00

Abstract:
Mount assembly with a monolithic mount formed by a mount ring with a plurality of retaining arms with free ends and an element, which retaining arms are arranged concentrically around the axis of symmetry of the mount ring and extend at least partially in axial direction. Three of the retaining arms contact an end face formed at the element and hold the element axially, while the other retaining arms are bonded to a circumferential surface formed at the element and prevent the element in particular from rotating.
Public/Granted literature
- US20170031126A1 LOW-STRESS MOUNT ASSEMBLY Public/Granted day:2017-02-02
Information query
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B7/00 | 光学元件的安装、调整装置或不漏光连接 |
G02B7/02 | .用于透镜 |