Invention Grant
- Patent Title: Semiconductor memory device having first and second floating gates of different polarity
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Application No.: US15146702Application Date: 2016-05-04
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Publication No.: US09966476B2Publication Date: 2018-05-08
- Inventor: Tomomitsu Risaki
- Applicant: SII Semiconductor Corporation
- Applicant Address: JP
- Assignee: SII Semiconductor Corporation
- Current Assignee: SII Semiconductor Corporation
- Current Assignee Address: JP
- Agency: Adams & Wilks
- Priority: JP2015-095004 20150507
- Main IPC: H01L27/115
- IPC: H01L27/115 ; H01L29/788 ; H01L29/66 ; H01L21/311 ; H01L21/28 ; H01L29/423 ; H01L29/51 ; H01L29/49

Abstract:
A semiconductor memory device includes a first floating gate and a second floating gate of conductivity types with different polarities. Injection of electrons into the first floating gate via a tunnel insulating film is stored through a decrease in holes in a valence band of the second floating gate, and ejection of electrons from the first floating gate via the tunnel insulating film is stored through an increase in holes in the valence band of the second floating gate.
Public/Granted literature
- US20160329339A1 SEMICONDUCTOR MEMORY DEVICE Public/Granted day:2016-11-10
Information query
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