Patterning method for graphene using hot-embossing imprinting
Abstract:
A patterning method of a graphene, including a step of forming a graphene layer on a polymer substrate; and a step of forming a nanopattern in the graphene layer by hot embossing imprinting. The step of forming a nanopattern in the graphene layer by hot embossing imprinting includes contacting a hot mold, in which a nanopattern is formed, or contacting a roll-to-roll hot mold, in which a nanopattern is formed, to the graphene layer, followed by heating and pressing the graphene layer. In the step of forming a nanopattern in the graphene layer, the graphene layer is cleaved by a protrusion of the nanopattern formed on the hot mold or the hot roll-to-roll mold, and the cleaved graphene is present on each of a protrusion and a recessed portion of the nanopattern formed in the polymer substrate under the graphene later.
Public/Granted literature
Information query
Patent Agency Ranking
0/0