Invention Grant
- Patent Title: Patterning method for graphene using hot-embossing imprinting
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Application No.: US14522095Application Date: 2014-10-23
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Publication No.: US09966531B2Publication Date: 2018-05-08
- Inventor: Byung Hee Hong , Jung Hee Han
- Applicant: Graphene Square Inc.
- Applicant Address: KR Seoul
- Assignee: Graphene Square, Inc.
- Current Assignee: Graphene Square, Inc.
- Current Assignee Address: KR Seoul
- Agency: Greer Burns & Crain, LTD.
- Priority: KR10-2012-0043147 20120425
- Main IPC: H01L51/00
- IPC: H01L51/00 ; B29C59/02 ; B29C59/04 ; H01L29/66 ; B82Y40/00 ; H01L29/16 ; B82Y10/00 ; B05D3/12 ; B32B37/00 ; B32B37/24 ; B32B38/06

Abstract:
A patterning method of a graphene, including a step of forming a graphene layer on a polymer substrate; and a step of forming a nanopattern in the graphene layer by hot embossing imprinting. The step of forming a nanopattern in the graphene layer by hot embossing imprinting includes contacting a hot mold, in which a nanopattern is formed, or contacting a roll-to-roll hot mold, in which a nanopattern is formed, to the graphene layer, followed by heating and pressing the graphene layer. In the step of forming a nanopattern in the graphene layer, the graphene layer is cleaved by a protrusion of the nanopattern formed on the hot mold or the hot roll-to-roll mold, and the cleaved graphene is present on each of a protrusion and a recessed portion of the nanopattern formed in the polymer substrate under the graphene later.
Public/Granted literature
- US20150104623A1 PATTERNING METHOD FOR GRAPHENE USING HOT-EMBOSSING IMPRINTING Public/Granted day:2015-04-16
Information query
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