Invention Grant
- Patent Title: Emission source and method of forming the same
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Application No.: US14484927Application Date: 2014-09-12
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Publication No.: US09966726B2Publication Date: 2018-05-08
- Inventor: Guichuan Xing , Nripan Mathews , Subodh Gautam Mhaisalkar , Tze Chien Sum
- Applicant: Nanyang Technological University
- Applicant Address: SG Singapore
- Assignee: NANYANG TECHNOLOGICAL UNIVERSITY
- Current Assignee: NANYANG TECHNOLOGICAL UNIVERSITY
- Current Assignee Address: SG Singapore
- Agency: Seed Intellectual Property Law Group LLP
- Main IPC: H01S3/04
- IPC: H01S3/04 ; H01S3/16 ; H01S5/36 ; H01S3/092 ; H01S3/0941 ; H01S3/17 ; H01S5/04
Abstract:
In various embodiments, an emission source may be provided. The emission source may also include a gain medium including a halide semiconductor material. The emission source may further include a pump source configured to provide energy to the gain medium.
Public/Granted literature
- US20150071319A1 EMISSION SOURCE AND METHOD OF FORMING THE SAME Public/Granted day:2015-03-12
Information query
