Invention Grant
- Patent Title: Microelectromechanical structure and device
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Application No.: US15064879Application Date: 2016-03-09
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Publication No.: US09969606B2Publication Date: 2018-05-15
- Inventor: Matti Liukku , Jaakko Ruohio , Hannu Vesterinen
- Applicant: MURATA MANUFACTURING CO., LTD.
- Applicant Address: JP Nagaokakyo-Shi, Kyoto
- Assignee: MURATA MANUFACTURING CO., LTD.
- Current Assignee: MURATA MANUFACTURING CO., LTD.
- Current Assignee Address: JP Nagaokakyo-Shi, Kyoto
- Agency: Squire Patton Boggs (US) LLP
- Priority: FI20155153 20150309
- Main IPC: B81B3/00
- IPC: B81B3/00 ; G01P15/125 ; H01G5/14 ; G01P15/08

Abstract:
A MEMS structure that provides an improved way to selectively control electromechanical properties of a MEMS device with an applied voltage. The MEMS structure includes a capacitor element that comprises at least one stator element, and at least one rotor element suspended for motion parallel to a first direction in relation to the stator element. The stator element and the rotor element form at least one capacitor element, the capacitance of which varies according to displacement of the rotor element from an initial position. The stator element and the rotor element are mutually oriented such that in at least one range of displacements of the rotor element from an initial position, the second derivative of the capacitance with respect to the displacement has negative values.
Public/Granted literature
- US20160264401A1 MICROELECTROMECHANICAL STRUCTURE AND DEVICE Public/Granted day:2016-09-15
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