Invention Grant
- Patent Title: Metal-free CVD coating of graphene on glass and other dielectric substrates
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Application No.: US15332562Application Date: 2016-10-24
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Publication No.: US09970101B2Publication Date: 2018-05-15
- Inventor: Xinyuan Liu , Robert George Manley , Robert Michael Morena , Zhen Song
- Applicant: Corning Incorporated
- Applicant Address: US NY Corning
- Assignee: CORNING INCORPORATED
- Current Assignee: CORNING INCORPORATED
- Current Assignee Address: US NY Corning
- Agency: Dinsmore & Shohl LLP
- Main IPC: H01L29/16
- IPC: H01L29/16 ; C01B31/04 ; C23C16/26 ; C03C17/22 ; C04B41/85 ; C23C16/02 ; C23C16/44 ; C01B32/182 ; C01B32/186
Abstract:
A catalyst-free CVD method for forming graphene. The method involves placing a substrate within a reaction chamber, heating the substrate to a temperature between 600° C. and 1100° C., and introducing a carbon precursor into the chamber to form a graphene layer on a surface of the substrate. The method does not use plasma or a metal catalyst to form the graphene.
Public/Granted literature
- US20170037510A1 METAL-FREE CVD COATING OF GRAPHENE ON GLASS AND OTHER DIELECTRIC SUBSTRATES Public/Granted day:2017-02-09
Information query
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