Invention Grant
- Patent Title: Systems and methods for vapor delivery in a substrate processing system
-
Application No.: US14798652Application Date: 2015-07-14
-
Publication No.: US09970108B2Publication Date: 2018-05-15
- Inventor: Jun Qian , Hu Kang , Purushottam Kumar , Chloe Baldasseroni , Heather Landis , Andrew Kenichi Duvall , Mohamed Sabri , Ramesh Chandrasekharan , Karl Leeser , Shankar Swaminathan , David Smith , Jeremiah Baldwin , Eashwar Ranganathan , Adrien LaVoie , Frank Pasquale , Jeongseok Ha , Ingi Bae
- Applicant: Lam Research Corporation
- Applicant Address: US CA Fremont
- Assignee: LAM RESEARCH CORPORATION
- Current Assignee: LAM RESEARCH CORPORATION
- Current Assignee Address: US CA Fremont
- Main IPC: C23C16/46
- IPC: C23C16/46 ; C23C16/455 ; C23C16/448

Abstract:
A vapor delivery system includes an ampoule to store liquid precursor and a heater to partially vaporize the liquid precursor. A first valve communicates with a push gas source and the ampoule. A second valve supplies vaporized precursor to a heated injection manifold. A valve manifold includes a first node in fluid communication with an outlet of the heated injection manifold, a third valve having an inlet in fluid communication with the first node and an outlet in fluid communication with vacuum, a fourth valve having an inlet in fluid communication with the first node and an outlet in fluid communication with a second node, a fifth valve having an outlet in fluid communication with the second node, and a sixth valve having an outlet in fluid communication with the second node. A gas distribution device is in fluid communication with the second node.
Public/Granted literature
- US20160032453A1 SYSTEMS AND METHODS FOR VAPOR DELIVERY Public/Granted day:2016-02-04
Information query
IPC分类: