Invention Grant
- Patent Title: Production of free-standing crystalline material layers
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Application No.: US14770194Application Date: 2014-02-20
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Publication No.: US09970126B2Publication Date: 2018-05-15
- Inventor: Richard J. Molnar
- Applicant: Massachusetts Institute of Technology
- Applicant Address: US MA Cambridge
- Assignee: Massachusetts Institute of Technology
- Current Assignee: Massachusetts Institute of Technology
- Current Assignee Address: US MA Cambridge
- Agent Theresa A. Lober
- International Application: PCT/US2014/017422 WO 20140220
- International Announcement: WO2014/133866 WO 20140904
- Main IPC: C30B23/02
- IPC: C30B23/02 ; C30B25/18 ; C30B29/40 ; H01L31/0304 ; C30B7/10 ; C30B9/04 ; C30B25/20 ; C30B29/36 ; H01L21/02

Abstract:
Herein is provided a growth structure for forming a free-standing layer of crystalline material having at least one crystallographic symmetry. The growth structure includes a host substrate and a separation layer disposed on the host substrate for growth of a layer of the crystalline material thereon. The separation layer has a separation layer thickness, and is mechanically weaker than the host substrate and the crystalline material. An array of apertures is in the separation layer, each aperture extending through the separation layer thickness.
Public/Granted literature
- US20160002822A1 Production of Free-Standing Crystalline Material Layers Public/Granted day:2016-01-07
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