Invention Grant
- Patent Title: Power supply device and method for plasma generation
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Application No.: US15053227Application Date: 2016-02-25
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Publication No.: US09974154B2Publication Date: 2018-05-15
- Inventor: Taizo Ito , Manabu Nakamura
- Applicant: Hitachi Kokusai Electric Inc.
- Applicant Address: JP Tokyo
- Assignee: HITACHI KOKUSAI ELECTRIC INC.
- Current Assignee: HITACHI KOKUSAI ELECTRIC INC.
- Current Assignee Address: JP Tokyo
- Agency: Bacon & Thomas, PLLC
- Priority: JP2013-174891 20130826
- Main IPC: H05H1/46
- IPC: H05H1/46

Abstract:
A power supply device includes: an oscillation unit for outputting a high frequency signal; a modulation unit for outputting a pulsed high frequency signal; a level adjustment unit for adjusting and outputting a level of the pulsed high frequency signal; a power amplifier for amplifying a power outputted from the level adjustment unit; an output power detection unit for detecting an output power value from the power amplifier; and a control unit. The control unit corrects and outputs a level control signal for controlling the level of the pulsed high frequency signal based on a corresponding correction factor at each of elapsed times in an on state of the pulsed high frequency signal, and compares comparison values in a current pulse and a previous pulse to update the correction factor such that comparison result between the set power value and the output power value becomes smaller at each reflection coefficient.
Public/Granted literature
- US20160174354A1 POWER SUPPLY DEVICE AND METHOD FOR PLASMA GENERATION Public/Granted day:2016-06-16
Information query
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