Invention Grant
- Patent Title: Plating apparatus and plating method
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Application No.: US15630130Application Date: 2017-06-22
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Publication No.: US09984910B2Publication Date: 2018-05-29
- Inventor: Yoshio Minami
- Applicant: EBARA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: EBARA CORPORATION
- Current Assignee: EBARA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2010-236524 20101021; JP2010-264648 20101129; JP2011-158484 20110719
- Main IPC: H01L21/677
- IPC: H01L21/677 ; C25D17/00 ; C25D17/06

Abstract:
A plating apparatus allows a substrate holder to be serviced easily while ensuring easy access to the substrate holder and while a substrate is being processed in the plating apparatus. The plating apparatus includes a plating section for plating a substrate, a substrate holder for holding the substrate, a substrate holder transporter for holding and transporting the substrate holder, a stocker for storing the substrate holder, and a stocker setting section for storing the stocker therein. The stocker includes a moving mechanism for moving the stocker into and out of the stocker setting section.
Public/Granted literature
- US20170287762A1 PLATING APPARATUS AND PLATING METHOD Public/Granted day:2017-10-05
Information query
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