Invention Grant
- Patent Title: Non-volatile semiconductor storage device and method of manufacturing the same
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Application No.: US15664924Application Date: 2017-07-31
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Publication No.: US09985050B2Publication Date: 2018-05-29
- Inventor: Yoshiaki Fukuzumi , Ryota Katsumata , Masaru Kidoh , Masaru Kito , Hiroyasu Tanaka , Yosuke Komori , Megumi Ishiduki , Hideaki Aochi
- Applicant: TOSHIBA MEMORY CORPORATION
- Applicant Address: JP Minato-ku
- Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-320215 20071211
- Main IPC: H01L27/11
- IPC: H01L27/11 ; H01L27/11582 ; H01L29/51 ; H01L27/11575 ; H01L27/11573 ; H01L27/105 ; G11C16/04 ; H01L27/11578 ; H01L27/11556 ; H01L27/11551

Abstract:
A non-volatile semiconductor storage device has a plurality of memory strings to each of which a plurality of electrically rewritable memory cells are connected in series. Each of the memory strings includes first semiconductor layers each having a pair of columnar portions extending in a vertical direction with respect to a substrate and a coupling portion formed to couple the lower ends of the pair of columnar portions; a charge storage layer formed to surround the side surfaces of the columnar portions; and first conductive layers formed to surround the side surfaces of the columnar portions and the charge storage layer. The first conductive layers function as gate electrodes of the memory cells.
Public/Granted literature
- US20170330895A1 NON-VOLATILE SEMICONDUCTOR STORAGE DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2017-11-16
Information query
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