Invention Grant
- Patent Title: Process for producing highly oriented humic acid films and highly conducting graphitic films derived therefrom
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Application No.: US15240543Application Date: 2016-08-18
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Publication No.: US09988273B2Publication Date: 2018-06-05
- Inventor: Aruna Zhamu , Bor Z Jang
- Applicant: Nanotek Instruments, Inc.
- Applicant Address: US OH Dayton
- Assignee: Nanotek Instruments, Inc.
- Current Assignee: Nanotek Instruments, Inc.
- Current Assignee Address: US OH Dayton
- Main IPC: C01B32/182
- IPC: C01B32/182 ; C01B31/04 ; C09K5/14 ; H01B1/04 ; C07D413/14

Abstract:
A process for producing a highly oriented humic acid (HA) film, comprising: (a) preparing a dispersion of HA or chemically functionalized HA (CHA) sheets dispersed in a liquid medium, wherein HA sheets contain an oxygen content higher than 5% by weight or CHA sheets contain non-carbon element content higher than 5% by weight; (b) dispensing and depositing HA or CHA dispersion onto a surface of a supporting substrate to form a wet layer, under an orientation-inducing stress; (c) removing liquid medium from the wet layer to form a dried HA or CHA layer having hexagonal carbon planes and an inter-planar spacing d002 of 0.4 nm to 1.3 nm as determined by X-ray diffraction; and (d) thermally reducing the dried HA or CHA layer at a first heat treatment temperature higher than 80° C. for a sufficient period of time to produce the film containing reduced HA or CHA.
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