- Patent Title: (Meth) acrylic block copolymer and process for producing the same
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Application No.: US14767676Application Date: 2014-03-05
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Publication No.: US09988477B2Publication Date: 2018-06-05
- Inventor: Seiya Shimizu , Hirotsugu Ida
- Applicant: KURARAY CO., LTD.
- Applicant Address: JP Kurashiki-shi
- Assignee: KURARAY CO., LTD.
- Current Assignee: KURARAY CO., LTD.
- Current Assignee Address: JP Kurashiki-shi
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2013-054528 20130318
- International Application: PCT/JP2014/055570 WO 20140305
- International Announcement: WO2014/148251 WO 20140925
- Main IPC: C08F220/10
- IPC: C08F220/10 ; C08F220/20 ; C08F297/02 ; C09D153/00 ; C09J153/00 ; C08F299/00 ; C08F4/52 ; C08F222/10

Abstract:
A (meth)acrylic block copolymer includes a methacrylic polymer block including at least one structural unit derived from a dimethacrylate according to formula (2): where R1 is a methyl group, R2 and R3 are each independently a hydrocarbon group having 1 to 6 carbon atoms, and n is an integer of 1 to 5, and a (meth)acrylic polymer block having no active energy ray curable groups. A method of preparing the (meth)acrylic block copolymer and an active energy ray curable composition are provided.
Public/Granted literature
- US20160002378A1 (METH) ACRYLIC BLOCK COPOLYMER AND PROCESS FOR PRODUCING THE SAME Public/Granted day:2016-01-07
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