Invention Grant
- Patent Title: Sintered compact magnesium oxide target for sputtering, and method for producing same
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Application No.: US14356395Application Date: 2012-12-25
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Publication No.: US09988709B2Publication Date: 2018-06-05
- Inventor: Akira Hisano , Yuichiro Nakamura
- Applicant: JX Nippon Mining & Metals Corporation
- Applicant Address: JP Tokyo
- Assignee: JX Nippon Mining & Metals Corporation
- Current Assignee: JX Nippon Mining & Metals Corporation
- Current Assignee Address: JP Tokyo
- Agency: Howson & Howson LLP
- Priority: JP2011-285757 20111227
- International Application: PCT/JP2012/083391 WO 20121225
- International Announcement: WO2013/099832 WO 20130704
- Main IPC: C23C14/00
- IPC: C23C14/00 ; C23C14/34 ; C04B35/053 ; C04B35/645 ; C23C14/08

Abstract:
A sintered compact magnesium oxide target for sputtering having a purity of 99.99 wt % or higher excluding C, a density of 3.57 g/cm3 or higher, and a whiteness of 60% or less. In order to uniformly deposit a magnesium oxide film, a magnesium oxide target having a higher purity and a higher density is being demanded. An object of this invention is to provide a target capable of realizing the above, and a method for producing such a target. While a magnesium oxide sintered compact sputtering target is produced by hot-pressing a raw material powder, there is a problem in that color shading occurs in roughly φ60 (within a circle having a diameter of 60 mm) at the center part of the target. Conventionally, no particularly attention was given to this problem. However, in recent years, it has become necessary to investigate and resolve this problem in order to improve the deposition quality.
Public/Granted literature
- US20140284212A1 Sintered Compact Magnesium Oxide Target for Sputtering, and Method for Producing Same Public/Granted day:2014-09-25
Information query
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