Invention Grant
- Patent Title: Method of forming a metal layer and method of manufacturing a substrate having such metal layer
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Application No.: US15127433Application Date: 2015-03-12
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Publication No.: US09988730B2Publication Date: 2018-06-05
- Inventor: Tadahiro Nishigawa , Jun Higuchi , Hitoshi Ishikawa
- Applicant: Atotech Deutschland GmbH
- Applicant Address: DE Berlin
- Assignee: Atotech Deutschland GmbH
- Current Assignee: Atotech Deutschland GmbH
- Current Assignee Address: DE Berlin
- Agency: Renner, Otto, Boisselle & Sklar, LLP
- Priority: JP2014-060460 20140324
- International Application: PCT/EP2015/055201 WO 20150312
- International Announcement: WO2015/144443 WO 20151001
- Main IPC: C25D5/34
- IPC: C25D5/34 ; C25D3/38 ; H05K3/46 ; H05K3/42 ; H05K1/02

Abstract:
In a substrate like a printed circuit board comprising an insulator and a copper layer laminated on part of the insulator, said insulator outer surface and said copper layer outer surface are simultaneously subjected to a process (1) comprising treatment with an alkali metal hydroxide solution, a process (2) comprising treatment with an alkaline aqueous solution containing an aliphatic amine, a process (3) comprising treatment with an alkaline aqueous solution having a permanganate concentration of 0.3 to 3.5 wt % and a pH of 8 to 11, a process (4) comprising treatment with an acidic microemulsion aqueous solution containing a thiophene compound and an alkali metal salt of polystyrenesulphonic acid, and a process (5) comprising copper electroplating, which are implemented sequentially.
Public/Granted literature
- US20170130354A1 METHOD OF FORMING A METAL LAYER AND METHOD OF MANUFACTURING A SUBSTRATE HAVING SUCH METAL LAYER Public/Granted day:2017-05-11
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