Invention Grant
- Patent Title: Electrochemical deposition apparatus and methods for controlling the chemistry therein
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Application No.: US14321146Application Date: 2014-07-01
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Publication No.: US09988735B2Publication Date: 2018-06-05
- Inventor: Demetrius Papapanayiotou , Arthur Keigler , Jonathan Hander , Johannes Chiu , David G. Guarnaccia , Daniel L. Goodman
- Applicant: TEL NEXX, INC.
- Applicant Address: US MA Billerica
- Assignee: TEL NEXX, INC.
- Current Assignee: TEL NEXX, INC.
- Current Assignee Address: US MA Billerica
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Main IPC: C25B15/08
- IPC: C25B15/08 ; C25B15/02 ; C25B9/18 ; C25D17/02 ; C25D21/14 ; C25D7/12 ; C25D21/18 ; C25D17/00

Abstract:
An electrochemical deposition system is described. The electrochemical deposition system includes one or more electrochemical deposition modules arranged on a common platform for depositing one or more metals on a substrate, and a chemical management system coupled to the one or more electrochemical deposition modules. The chemical management system is configured to supply at least one of the one or more electrochemical deposition modules with one or more metal constituents for depositing the one or more metals. The chemical management system can include at least one metal enrichment cell and at least one metal-concentrate generator cell.
Public/Granted literature
- US20150008133A1 ELECTROCHEMICAL DEPOSITION APPARATUS AND METHODS FOR CONTROLLING THE CHEMISTRY THEREIN Public/Granted day:2015-01-08
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