Invention Grant
- Patent Title: Epitaxial diamond layer and method for the production thereof
-
Application No.: US14996835Application Date: 2016-01-15
-
Publication No.: US09988737B2Publication Date: 2018-06-05
- Inventor: Christoph E Nebel , Claudia Widmann
- Applicant: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.
- Applicant Address: DE Munich
- Assignee: FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
- Current Assignee: FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
- Current Assignee Address: DE Munich
- Agency: Brinks Gilson & Lione
- Priority: DE102015200692 20150119
- Main IPC: C30B25/18
- IPC: C30B25/18 ; C30B29/04 ; C30B29/10

Abstract:
An epitaxial diamond layer and a method for the production thereof can be provided that comprises the following steps: providing a substrate; depositing a metal layer on at least a subarea of the substrate, wherein the metal layer contains, or consists of, at least one period 4, 5 or 6 metal having a melting point of greater than or equal to 1200 K; and depositing a diamond layer on at least a subarea of the metal layer; wherein at least one intermediate layer is deposited between the metal layer and the diamond layer and has a higher lattice constant than undoped crystalline diamond and a lower hardness than undoped crystalline diamond.
Public/Granted literature
- US20160208413A1 EPITAXIAL DIAMOND LAYER AND METHOD FOR THE PRODUCTION THEREOF Public/Granted day:2016-07-21
Information query
IPC分类: