Invention Grant
- Patent Title: Mask plate, method for manufacturing color film substrate and color film substrate
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Application No.: US14742608Application Date: 2015-06-17
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Publication No.: US09989682B2Publication Date: 2018-06-05
- Inventor: Xuepei Cheng , Dongdong Yin , Xuequan Yu , Zhiqiang Li
- Applicant: BOE TECHNOLOGY GROUP CO., LTD. , HEFEI BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Beijing CN Hefei, Anhui Province
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.,HEFEI BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.,HEFEI BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Beijing CN Hefei, Anhui Province
- Agency: Womble Bond Dickinson (US) LLP
- Priority: CN201510103229 20150309
- Main IPC: G02B5/22
- IPC: G02B5/22 ; G02B5/20 ; G02F1/1335 ; G03F7/00

Abstract:
A mask plate, a method for manufacturing a color film substrate and a color film substrate for decreasing the segment difference of the color filter layer are disclosed. The mask plate includes a plurality of first regions, each of the plurality of first regions corresponding to each subpixel unit; and a second region between two adjacent first regions. Each first region is respectively provided with one first subregion for forming a color filter layer pattern within an opening region of a black matrix layer, and two second subregions for forming a color filter layer pattern within a non-opening region of the black matrix layer. The first subregion is between the two second subregions. In each second subregion: along the direction away from the first subregion, the transmittance of the second subregion gradually decreases or increases.
Public/Granted literature
- US20160266287A1 MASK PLATE, METHOD FOR MANUFACTURING COLOR FILM SUBSTRATE AND COLOR FILM SUBSTRATE Public/Granted day:2016-09-15
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