Invention Grant
- Patent Title: Onium salt compound, resist composition, and pattern forming process
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Application No.: US14829832Application Date: 2015-08-19
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Publication No.: US09989847B2Publication Date: 2018-06-05
- Inventor: Masaki Ohashi , Jun Hatakeyama , Masahiro Fukushima
- Applicant: SHIN-ETSU CHEMICAL CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2014-168165 20140821
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/40 ; C07D209/04 ; C07D209/08 ; C07D215/14 ; C07D275/06 ; C07D277/64 ; C07D261/20 ; C07D249/20 ; C07D235/08 ; C07D231/12 ; C07D233/18 ; C07D209/60 ; C07D231/06 ; C07D231/56 ; G03F7/038 ; G03F7/16 ; G03F7/20 ; G03F7/38 ; G03F7/32 ; C07D209/42 ; C07D215/48 ; C07D215/06 ; C07D215/50 ; C07D241/44 ; C07D235/06 ; C07D249/18 ; C07D277/74 ; C07D209/18 ; C07D263/58 ; C07D277/68 ; C07D209/62 ; C07D263/56 ; G03F7/039
Abstract:
Sulfonium and iodonium salts of nitrogen-containing carboxylic acids are novel. The onium salt functions as an acid diffusion controlling agent in a resist composition, enabling to form a pattern of good profile with high resolution, improved MEF, LWR and DOF.
Public/Granted literature
- US20160259242A1 NOVEL ONIUM SALT COMPOUND, RESIST COMPOSITION, AND PATTERN FORMING PROCESS Public/Granted day:2016-09-08
Information query
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