Photoconductor, image forming method using the same, method of manufacturing the photoconductor, and image forming apparatus
Abstract:
Disclosed herein is a photoconductor containing an electroconductive substrate and a photosensitive layer, wherein, in a curve obtained by the steps (I) through (V) described herein, a surface of the photosensitive layer has a WRa (LML) of from 0.02 μm to 0.03 μm, a WRa (LHL) of from 0.006 μm to 0.01 μm, and a WRa (HLH) of 0.001 μm or less, where the arithmetical mean roughness (WRa) are defined as Ra in JIS-B0601:2001 and WRa (HHH) to WRa (LLL) represent individual Ra's as described herein.
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